MeiVac

For more than 15 years, MeiVac has developed increasingly sophisticated thin film deposition equipment and processes to meet ever more stringent customer needs: Landmark RF Diode dielectric sputtering systems enabling high throughput deposition of thick alumina layers used in Thin Film Heads. Multi-chamber processing on the company's 602 Series clu... ster platform to allow multi-layer insitu processing or higher thruput single layer processing. Precise film property control, including exceptional film thickness uniformities. A process development team to help customers optimize process and equipment performances for their specific applications. An expanded Components Product Line resulting from the acquisition of US, Inc. and their popular MAK sputter sources and substrate heaters. A broad range of high-precision vacuum throttle valves. Complex sub-systems designed for customer's unique requirements, often incorporating MeiVac sputter sources, substrate heaters, etc.Read More