(23 Total References)
Dupont Photomasks, AMD, Micron Technology and Motorola Extend Agreement for DPI
We recognized early on that the most efficient way to meet the advanced development and technology demands in our industry is through joint collaboration of mask engineers with semiconductor engineers in a dedicated development facility , added Preston Adcox , president and chief_operating_officer of DPI.Renewing the RTC agreement through 2002 verifies that a collaborative research and development model is beneficial to all companies involved..
DuPont Photomasks, Inc.
PRESTON M. ADCOXPresident and Chief Operating Officer
joined E.I. DuPont de Nemours & Co. in 1967.He
has held various manufacturing and technology management positions with DuPont's Polyolefins, Engineering Polymers and High Performance Films businesses.From 1982 to 1988, Preston
was business director of Kapton ® and Teflon ®, DuPont's High Performance Films business.In 1988, he
became managing director of DuPont's Semiconductor Materials business.He
was appointed president and chief operating officer of DuPont Photomasks, Inc. in 1996.
Since 1988, Preston
has served on the board of directors of SEMI/SEMATECH, a non-profit consortium established to support the U.S. semiconductor supplier infrastructure.In 1990, he
was named a founding member of the board of directors of Etec Systems Inc., and he
served on the board until 1995.Preston
earned a bachelor's degree in mechanical engineering from the University of Arkansas and a master's degree in mechanical engineering from the University of Florida.He
is a member of the board of director's for United Way.
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Executive Vice President of Finance and Chief Financial Officer
Photonics Online: Digital Marketplace for the photonics industry
The installation of these advanced systems represents a major investment by DPI to expand our global capacity and capability to meet the increasing demand for leading-edge photomasks, said Preston Adcox, president and chief operating officer of DPI.DPI has added eight laser based lines and three electron beam lines throughout the world over the past year, and will continue to invest in both technologies to meet the needs of our broad, global customer base..
For a large portion of advanced masks, the ALTA 3700 made by Etec Systems, an Applied Materials company, offers significant advances in lithographic quality particularly in critical dimension (CD) and registration capability.The system is capable of writing advanced phase shift masks (PSM) and optical proximity correction (OPC) masks.
DuPont Photomasks, Inc.
DuPont Photomasks, Inc. Names Peter S. Kirlin CEO and Chairman Preston M. Adcox, President and Chief Operating Officer, Elected to Board of Directors
...Preston M. Adcox, President and Chief Operating Officer, Elected to Board of Directors
...In addition, the board of directors announced that Preston M. Adcox , DPI's president and chief operating officer, has been elected to the board.
...Adcox joined E.I. DuPont de Nemours & Co. in 1967 where he held various manufacturing and technology management positions.In 1988, he became managing director of DuPont's Semiconductor Materials division, which included the photomask business unit.In 1996, he was appointed president and chief operating officer of DuPont Photomasks, Inc., coincident with the company's initial public offering of stock.Adcox served on the board of directors of the Semiconductor Industry Suppliers Association (SISA), (formerly SEMI/SEMATECH,) a non-profit consortium established to support the U.S. semiconductor supplier infrastructure, from 1988 until 1999.In 1990, he was named a founding member of the board of directors of Etec Systems, Inc., and he served on the board until 1995.Adcox earned a bachelor's degree in mechanical engineering from the University of Arkansas and a master's in mechanical engineering from the University of Florida.
KLA-Tencor and DuPont Photomasks announce successful inspection tool test on reticles developed for 130 nm and smaller design rule
As a technology leader, DuPont Photomasks is committed to developing advanced process technology and outfitting our facilities with advanced equipment in order to support the expected increase in demand for photomasks supporting 130 nm design rules," said Preston Adcox, president and chief operating officer of DuPont Photomasks."When used in conjunction with the multiple 130 nm production lines we have installed worldwide, we expect KLA-Tencor's TeraStar system will play a critical role in providing our customers with the high-quality sub-wavelength photomasks they will require to meet their advanced production and research and development needs."
"Our role as a partner in the development of the TeraStar
tool highlights our practice of partnering with our strategic suppliers to ensure their new tools provide the capabilities needed to help us deliver the most advanced mask technology to our customers, ahead of our competition," continued Adcox