"Synopsys phase-shift technology allows us to tightly control lithography resolution and enhance yields on our high-performance chips," said Mark Mason, resolution enhancement technology manager, Texas Instruments.
"We are excited to see the increasing momentum of the DFMC," says Mark Mason, director for Design Data Integration at Texas Instruments.
has already taped out several circuits using OpenDFM rules and we are seeing return on our investment in the OpenDFM standard in the form of interoperability and reuse.
reports that they are planning to use OpenDFM's DRC standard as the baseline for several of their production flows.
"We are currently moving our entire 28 nm Wireless platform DRC infrastructure to the OpenDFM standard, and plan to use it at 20 nm as well," Mason
"OpenDFM is already paying off for TI
and the addition of DRC+ capabilities is very exciting.
"Si2 Releases OpenDFM 1.0 Physical Verification Standard,"MCADCafe, November 9, 2010
At a recent conference in Santa Clara, Mark Mason, Director of Design Data Integration for Texas Instruments, commented that Texas Instruments has demonstrated coverage, performance and accuracy of OpenDFM 1.0, working with all major EDA vendors.
No loss of performance versus native code was observed, and all vendors passed the OpenDFM test cases developed by TI
and contributed to Si2.
also stated that he
believed OpenDFM 1.0 is verified, and that TI
intends to implement it into production as soon as possible.
For details on his
comments, see this link: http://www.si2.org/events_dir/2010/confall10/7.pdf
Mark Mason,"DFM EDA Technology: A Lithographic Perspective", 2007 Symposium on VLSI Technology Digest of Technical Papers http://ieeexplore.ieee.org/stamp/stamp.jsp?arnumber=04339739
Mark Mason, RET manager at Texas Instruments, told attendees that "DFM is no longer just a nice thing to have.
First-pass success is expected.
Mark Terry; Gary Zhang; George Lu; Simon Chang; Tom Aton; Robert Soper; Mark Mason; Shane Best; Bill Dostalik; Stefan Hunsche; Jiang Wei Li; Rongchun Zhou; Mu Feng; Jim Burdorf "Process window and interlayer aware OPC for the 32-nm node," Proc. of SPIE Vol.
Sean O'Brien, Robert Soper, Shane Best, Mark Mason
, "Rules Based Process Window OPC," Proc. of SPIE Vol.
"Synopsys' mask synthesis solutions offer the critical dimension accuracy and near-linear scalability that we require to meet the complex data processing needs for our advanced 65nm and 45nm technology," said Mark Mason, TI's resolution enhancement technology manager, in a statement issued by Synopsys.
"Eventually, increasing design complexity will no longer be supported by traditional geometric rules," said Mark Mason, reticle enhancement technology (RET) manager at Texas Instruments Inc.
"A model-based, design rule checks solution will be required.
, "Mask rule standards: A baby step for DfM," Solid State Technology, Volume 15, Issue 2 http://www.electroiq.com/articles/mlw/print/volume-15/issue-2/featured/mask-rule-standards-a-baby-step-for-dfm.html
, "The real cost of RETs," Solid State Technology,Volume 12, Issue 2 http://www.electroiq.com/articles/mlw/print/volume-12/issue-2/featured/the-real-cost-of-rets.html