"Until now, multi-million dollar stepper technology was the only solution for volume production of sub-micron images," commented James Hermanowski, manager of the compound semiconductor business unit at SUSS MicroTec.
"With this new technology, SUSS offers customers a low-cost option for sub-micron production with the added benefits of increased yield and throughput."
Contact printing has always offered image quality and resolution when paired with the appropriate wavelength light source (DUV, i-line, g-line, broadband) and matching photoresist process.
The availability of high quality sub-micron masks and damage caused by contact between the mask and wafer have prevented more wide-spread adoption.
"These results show that another option is available for sub-micron imaging at only a fraction of the cost of ownership of stepper technology," added Hermanowski
"This technology has the potential to enable the manufacture of volume and diversity of products at economies not achievable through other means, or with such limited financial risk."Key companies featured:SUSS MicroTec
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